Wafer Defect Inspection Equipment Nitrogen AOI

Wafer Defect Inspection Equipment Nitrogen AOI	WIE100
Product Description	This is an automatic / semi-automatic visual inspection system. It is designed to detect defects generated during the epitaxy process of compound semiconductor wafers, including scratches, protrusions, pits, particles, stains, discoloration and other anomalies.
Applications	1.Incoming inspection of substrate wafers at epitaxy foundries 2.Quality control inspection for post-epitaxy processes
Inspection Method	Non-contact automated vision inspection
Applicable Materials	Surface defect inspection for patterned and unpatterned GaAs, GaSb, InP substrates and epitaxial layers
Camera Specification	4K 5 μm line scan camera
Objective Magnification	20X
Pixel Resolution	0.25μm
Detection Precision	1μm